In this study, a new Cr(III)-imprinted polymer (Cr(III)-IIP) is prepared from CrCl3·6H2O, methacrylic acid functional monomer, ethyleneglycoldimethacrylate cross-linking agent, 2,2?-azobisisobutyronitrile radical initiator and 2,2-(azanediylbis (ethane-2,1-diyl))bis(isoindoline-1,3-dione) ligand. To obtain the maximum adsorption capacity, the optimum condition was studied through pH, type and concentration of eluent, IIP weight, sample volume as well as the adsorption and desorption times. The Cr(III) ion content was determined via flame atomic absorption spectrometer. In optimum conditions, the adsorption capacity of the IIP for Cr(III) was obtained to be 74.65 mg g?1, using 50 mg of IIP and the initial pH solution of 3.0. Both the adsorption and desorption times for quantitative analyses of Cr(III) ions were 15 and 5 min; respectively. After elution of the adsorbed ions by 3 mL of 4 mol L?1 HNO3 aqueous solution, the established IIP-based SPE procedure provides a reasonable pre-concentration factor of 100. The IIP-based pre-concentration method provides a low detection limit of 1.7 µg L?1 with good repeatability (RSD?=?3.22%). Reusability studies confirmed that synthesis IIP is reusable and recoverable up to six cycles. According to the selectivity experiments, it was concluded that the prepared sorbent possesses more affinity toward Cr(III) ions than other ions such as Al3+, Pb2+, Cu2+, Mn2+, Fe2+, Zn2+, and Ni2+ ions. To evaluate the potential applicability of the proposed separation method, the pre-concentration and determination of trace amounts of Cr(III) were performed successfully in food samples with complex matrices, a bestial sample (i.e. cow liver) and an herbal product (i.e., broccoli) as real samples. 相似文献
We give the form of the output function in Ginsburg’s machine in which the input and output dictionaries are abelian groups and the transition function is of a special form. 相似文献
Rotating detonation combustors (RDC) are at the forefront of pressure gain combustion (PGC) research. The simplicity in design and the ease of assembly makes it a promising technology that could be integrated into existing combustor architectures. This is, however, coupled with the considerable complexities of the detonation-based flow field, and the associated modes and coupling mechanisms. The current paper is an overview of the research done at the University of Cincinnati to address some of the challenges and questions pertaining to the physics of RDC operation. Issues such as combustor geometry, injection schemes and mixing, varied reactants behavior and modes of RDC operation are discussed. The effects of pressurization of the combustor, along with other detonation enhancement strategies are also deliberated upon. When appropriate, parallels are drawn to the phenomena of high frequency combustion instabilities to address the similarities in observations between the two fields. 相似文献
By introducing a memristor into a chaotic system with a single non-quadratic term and substituting an absolute value function for conditional symmetry, a unique chaotic system is constructed. Firstly, the system shares a special structure of symmetry and conditional symmetry. Secondly, the amplitude and frequency of the system variables can be rescaled by the applied memristor. Interestingly it gives a new case of attractor control namely partial amplitude control and global frequency control. At last, as a new regime of extreme multistability, the memristive system shows relatively simple bifurcation according to the initial condition. This new class of chaotic system has never been reported to the best of our knowledge.
Based on the surface passivation of n-type silicon in a silicon drift detector(SDD), we propose a new passivation structure of SiO2/Al2O3/SiO2 passivation stacks. Since the SiO2 formed by the nitric-acid-oxidation-of-silicon(NAOS)method has good compactness and simple process, the first layer film is formed by the NAOS method. The Al2O3 film is also introduced into the passivation stacks owing to exceptional advantages such as good interface characteristic and simple process. In addition, for requirements of thickness and deposition temperature, the third layer of the SiO2 film is deposited by plasma enhanced chemical vapor deposition(PECVD). The deposition of the SiO2 film by PECVD is a low-temperature process and has a high deposition rate, which causes little damage to the device and makes the SiO2 film very suitable for serving as the third passivation layer. The passivation approach of stacks can saturate dangling bonds at the interface between stacks and the silicon substrate, and provide positive charge to optimize the field passivation of the n-type substrate.The passivation method ultimately achieves a good combination of chemical and field passivations. Experimental results show that with the passivation structure of SiO2/Al2O3/SiO2, the final minority carrier lifetime reaches 5223 μs at injection of 5×1015 cm-3. When it is applied to the passivation of SDD, the leakage current is reduced to the order of nA. 相似文献